Vertical type semiconductor device and fabrication method thereof

ABSTRACT

A vertical memory device and a method of fabricating the same are provided. The vertical type semiconductor device includes a common source region formed in a cell area of a semiconductor substrate. A channel region is formed on the common source region. The channel region has a predetermined height and a first diameter. A drain region is formed on the channel region. The drain region has a predetermined height and a second diameter larger than the first diameter. A first gate electrode surrounding the channel region.

CROSS-REFERENCES TO RELATED APPLICATION

This application claims priority under 35 U.S.C. 119(a) to Koreanapplication number 10-2012-0146381, filed on Dec. 14, 2012, in theKorean Intellectual Property Office, which is incorporated herein byreference in its entirety.

BACKGROUND

1. Technical Field

Various embodiments generally relates to a vertical type semiconductordevice, and more particularly, to a vertical type semiconductor deviceand a method of fabricating the same.

2. Related Art

The distribution rate of portable digital devices has been increasingday by day and ultra-high integration, ultra-high speed, and ultra-lowpower of memory devices, which are embedded in a limited size to processlarge capacity of data with high speed, have been required.

Studies on vertical memory devices have been actively progressed to meetthese demands. Recently, the vertical structures are introduced intoresistance memory devices which are spotlighted as next-generationmemory devices.

The resistance memory devices are devices which select a memory cellthrough an access device, change a resistance state of a data storagematerial electrically connected to the access device, and store data.There are typically phase-change random access memories (PCRAMs),resistance RAMs (ReRAMs), magnetoresistive RAMs (MRAMs), and the like asthe resistance memory devices.

Diodes or transistors may be employed as the access device of theresistive memory devices. In particular, the threshold voltage of thetransistors is controlled to be low as compared with the diodes and thusthe operation voltage thereof can be reduced, and the transistors havereceived attention again as the access device of the resistance memorydevices by applying the vertical structure thereto.

That is, since the voltage of 1.1 V or more has to be applied to thediodes, there is a limitation to reduce an operation voltage of thediodes. Further, when the diodes are formed on a word line, a resistanceof the word line is varied according to locations in the cells to causeword line to be bounced.

Since transistors in the related art are formed in a horizontalstructure, the reduction rate is restricted. However, the verticaltransistors can sufficiently ensure current drivability in the limitedchannel area. Further, voltage drop due to an external resistancecomponent may be improved through reduction in a source resistance.

However, when a current vertical structure transistor is formed, avertical structure transistor is formed by etching a semiconductorsubstrate in a cell area and a horizontal structure transistor is formedin the semiconductor substrate in a peripheral area. Therefore, desireddegree of integration may not be obtained in a subsequent process due toa step between the cell area and the peripheral area. Further, there isa need for an alternative to compensate current drivability of thetransistor lower than the diode.

SUMMARY

An exemplary vertical type semiconductor device may include a commonsource region formed in a cell area of a semiconductor substrate; achannel region formed on the common source region, the channel regionhaving a predetermined height and a first diameter; a drain regionformed on the channel region, the drain region having a predeterminedheight and a second diameter larger than the first diameter; and a firstgate electrode surrounding the channel region.

A method of fabricating an exemplary vertical type semiconductor devicemay include providing a semiconductor substrate having a cell area and aperipheral area; patterning the semiconductor substrate of the cell areato form a pillar structure; forming, in the pillar structure, a recessfrom a bottom of the pillar structure to a predetermined height; andforming a first gate electrode to surround the recess.

These and other features, aspects, and implementations are describedbelow in the section entitled “DETAILED DESCRIPTION”.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other aspects, features and other advantages of thesubject matter of the present disclosure will be more clearly understoodfrom the following detailed description taken in conjunction with theaccompanying drawings, in which:

FIGS. 1 to 18 are views illustrating a method of fabricating anexemplary vertical type semiconductor device.

DETAILED DESCRIPTION

Hereinafter, exemplary implementations will be described in greaterdetail with reference to the accompanying drawings. In drawings, (a) isa cross-sectional view of a vertical type semiconductor device in afirst direction (an X-direction, a A1-A2 direction of (c) in eachdrawing), for example, a word line direction, (b) is a cross-sectionalview of the vertical type semiconductor device in a s direction (aY-direction, a B1-B2 direction of (c) in each drawing), for example, abit line direction, (c) is a plan view of the vertical typesemiconductor device, and (p) is a cross-sectional view of a peripheralarea of a vertical type semiconductor device.

Exemplary implementations are described herein with reference tocross-sectional illustrations that are schematic illustrations ofexemplary implementations (and intermediate structures). As such,variations from the shapes of the illustrations as a result, forexample, of manufacturing techniques and/or tolerances, are to beexpected. Thus, exemplary implementations should not be construed aslimited to the particular shapes of regions illustrated herein but maybe to include deviations in shapes that result, for example, frommanufacturing. In the drawings, lengths and sizes of layers and regionsmay be exaggerated for clarity. Like reference numerals in the drawingsdenote like elements. It is also understood that when a layer isreferred to as being “on another layer or substrate, it can be directlyon the other or substrate, or intervening layers may also be present.

FIGS. 1 to 18 are views illustrating a method of fabricating anexemplary vertical semiconductor device.

Referring to FIG. 1, a hard mask 105 is formed on a semiconductorsubstrate 101. A cell area and a peripheral area are defined by a deviceisolation layer 103 and active regions in the peripheral area aredefined by the device isolation layer 103. At this time, an ionimplantation process is selectively performed only the cell area tosequentially form a drain region, a channel region, and a common sourceregion in the semiconductor substrate 101 fiducially a surface of thesemiconductor substrate 101. The ion implantation process may beperformed in a subsequent process.

The semiconductor substrate 101 may include a semiconductor material,such as silicon (Si), silicon germanium (SiGe) or gallium arsenic (GaAs)and may have a single-layered structure or a multiple-layered structure.

As illustrated in FIG. 2, the semiconductor substrate 101 of the cellarea is patterned in a second direction (a Y-direction) to form a firstpattern structure. The reference numeral 101A in FIG. 2 denotes a commonsource region and 105 denotes a hard mask. Although the common sourceregion 101A has been described as being previously formed,alternatively, the common source region 101A may be formed in asubsequent process.

As illustrated in FIG. 3, a first insulating layer 107 and a secondinsulating layer 109 are sequentially formed between first patternstructures in the cell area and then planarized to expose a surface ofthe hard mask 105. Here, the first insulating layer 107 and the secondinsulating layer 109 may include a combination of materials havingdifferent etch selectivities with respect to each other. For example,the first insulating layer 107 may be formed of an oxide and the secondinsulating layer 109 may be formed of a nitride, which has a higher etchselectivity than the oxide.

The first insulating layer 107 formation region may be replaced with agate electrode region in a subsequent process. Thus, a height of thefirst insulating layer 107 may be based on a desired channel height.

After the first and second insulating layers 107 and 109 are formedbetween the first pattern structures, a patterning process is performedon the semiconductor substrate in a first direction (an X-direction) toform a second pattern structure as illustrated in FIG. 4. Accordingly,surface of the semiconductor substrate 101 of space between the secondpattern structures are exposed.

After the second pattern structure is formed, as illustrated in FIG. 5,an oxidation process is performed on the exposed surface of thesemiconductor substrate 101 to form a first gate insulating layer 111. Athird insulating layer 113 is formed between second pattern structuresfrom the semiconductor substrate 101 to a predetermined height. Thethird insulating layer 113 may be replaced with a gate electrode in asubsequent process. Thus, a height of the third insulating layer 113 maybe equal to a height of the first insulating layer 107. Further, thethird insulating layer 113 may be formed of a material having the sameetch characteristic as that of the first insulating layer 107. Forexample, the third insulating layer 113 may be formed of an oxide.

As illustrated in FIG. 6, a protection material is formed on thesemiconductor substrate, including the third insulating layer 113, andis then etched back to form a protection layer 115 on a sidewall of thesecond pattern structure. The protection layer 115 may formed, forexample, using a nitride and may protect the sidewall of the secondpattern structure to prevent the semiconductor substrate 101 from beingrecessed in a subsequent process.

FIG. 6 illustrates a state after forming the protection layer 115. Asurface of the semiconductor substrate is covered with the hard mask105, the sidewall of the second pattern structure is covered with theprotection layer 115, and a surface of the third insulating layer 113 isexposed. Therefore, the third insulating layer 113 and the firstinsulating layer 107 may be removed through the exposed surface of thethird insulating layer 113.

FIG. 7 illustrates a state in which the first and third insulatinglayers 107 and 113 are removed. A pillar structure is formed by theremoval of the first and third insulating layers 107 and 113.

As illustrated in FIG. 8, a surface, exposed by the removal of the firstand third insulating layers 107 and 113, of the semiconductor substrate101 is recessed to a predetermined depth. The semiconductor substrate101 may be recessed using an isotropic wet etching process. The recessedportion of the semiconductor substrate becomes a gate electrodeformation region 200-1.

By recessing the semiconductor substrate 101, a diameter S1 of a portionof the semiconductor substrate 101 around the gate electrode formationregion 200-1 is made smaller than a diameter S2 of an upper portion ofthe semiconductor substrate 101. The portion of the semiconductorsubstrate 101 having the diameter S1 may be formed, in a subsequentprocess, into a channel region. The upper portion of the semiconductorsubstrate 101 having the diameter S2 may be formed, in a subsequentprocess, into a drain region. Since the diameter S2 of the drain regionis larger than the diameter S1 of the channel region as illustrated inFIG. 8, an external resistance component may be reduced and the gateelectrode may be more easily controlled.

As illustrated in FIG. 9, a second gate insulating layer 117 is formedon the exposed portion of the semiconductor substrate 101 in the gateelectrode formation region 200-1. The second gage insulating layer 117may include a single layer or multiple layers using oxide of Si,tantalum (Ta), titanium (Ta), barium titanium (BaTi), barium zirconium(BaZr), zirconium (Zr), hafnium (Hf), lanthanum (La), aluminum (Al),yttrium (Y), or zirconium silicon (ZrSi). Alternatively, the second gageinsulating layer 117 may include a single layer or multiple layers usinga nitride of Si, Ta, Ti, BaTi, BaZr, Zr, Hf, La, Al, Y, or ZrSi.

As illustrated in FIG. 10, an electrode material 119 is formed to insideof the gate electrode formation region 200-1. The electrode material 119may be a metal, a metal alloy, a metal oxynitride, or a conductivecarbon compound. For example, the electrode material 119 may be tungsten(W), copper (Cu), titanium nitride (TiN), tantalum nitride (TaN),tungsten nitride (WN), molybdenum nitride (MoN), niobium nitride (NbN),titanium silicon nitride (TiSiN), titanium aluminum nitride (TiAlN),titanium boron nitride (TiBN), zirconium silicon nitride (ZrSiN),tungsten silicon nitride (WSiN), tungsten boron nitride (WBN), zirconiumaluminum nitride (ZrAlN), molybdenum silicon nitride (MoSiN), molybdenumaluminum nitride (MoAlN), tantalum silicon nitride (TaSiN), tantalumaluminum nitride (TaAlN), titanium Ti), molybdenum (Mo), tantalum (Ta),titanium silicide (TiSi), tantalum silicide (TaSi), titanium tungsten(TiW), titanium oxynitride (TiON), titanium aluminum oxynitride(TiAlON), tungsten oxynitride (WON), or tantalum oxynitride (TaON).Alternatively, the electrode material 119 may include a semiconductormaterial, such as doped-Si and doped-SiGe, or the like.

As illustrated in FIG. 11, the buried electrode material 119 isselectively removed through an exposed surface of the electrode material119 between the second pattern structures, so that the remainingelectrode material 119 surrounds a sidewall of the semiconductorsubstrate 101 around the gate electrode formation region 200-1. As aresult, a portion of the semiconductor substrate 101 surrounded by theelectrode material 119 serves as a channel region CH. As described inFIG. 8, the semiconductor substrate 101 is recessed to reduce a diameterof the channel region. Thus, a drain region D over the channel regionmay be formed to have a larger diameter than the channel region (CH).Thus, an external resistance component for the drain region may bereduced.

FIG. 12 illustrates a state in which a fourth insulating layer 121 isburied between pillar structures to separate cells. It can be seen fromFIG. 12 that the electrode material 119 surrounds the channel region CH.

Subsequently, a process for forming a transistor in the peripheral areais performed. First, as illustrated in FIG. 13, the hard mask 105 isremoved and a third gate oxide layer 123 and a first conductive layer125 are sequentially formed on the semiconductor substrate including thecell area and a peripheral area (FIG. 13 c). The reference numeral 300denotes a bottom structure of the cell area formed by the processesillustrated in FIGS. 1 to 12.

Alternatively, if the ion implantation process for forming the drainregion, the channel region, and the common source region is notperformed after the device isolation process in FIG. 1, the ionimplantation process may be performed on the semiconductor substrate 101of the cell area to form the common source region, the channel region,and the drain region after the hard mask 105 of the cell area isremoved.

Even if the common source region, the channel region, and the drainregion are formed in any process among the above-described processes,the transistor may be an NMOS type, a PMOS type, or an impact-ionizationMOS (I-MOS) type, based on a conductivity type of an impurity implantedto each region. In particular, the transistor may be an NMOS type.

If the NMOS transistor is formed, then N-type ions may be implanted intothe common source region 101A and the drain region D, and P-type ionsmay be implanted into the channel region CH. If the PMOS transistor isformed, then P-type ions may be implanted into the common source region101A and the drain region D, and N-type ions may be implanted into thechannel region CH.

On the other hand, if an I-MOS transistor is formed, N⁺-type ions may beimplanted into the common source region 101A, P⁺-type ions may beimplanted into the drain region D, and P⁻ type ions, N⁻-type ions, or acombination thereof may be implanted into the channel region CH.Alternatively, P⁺-type ions may be implanted into the common sourceregion 101A, N⁺-type ions may be implanted into the drain region D, andP⁻-type ions, N⁻-type ions, or a combination thereof may be implantedinto the channel region CH.

Since a memory cell, which is connected to a vertical transistor havingthe surround structure and formed in the bottom structure 300 of thecell area and serves as a data storage unit, is to be formed, asillustrated in FIG. 14, the first conductive material 125 and the thirdgate oxide layer 123 in the cell area are removed. A second conductivelayer 127, a barrier metal layer 129, a third conductive layer 131, anda hard mask 133 are sequentially formed on the semiconductor substrate,including the cell area and the peripheral area.

Here, the second conductive layer 127, the barrier metal layer 129, andthe third conductive layer 131 serve as a lower electrode in the cellarea. The first conductive layer, 125, the second conductive layer 127,the barrier metal layer 129, and the third conductive layer 131 serve asa gate electrode of the transistor in the peripheral area.

Each of the first conductive layer 125, the second conductive layer 127,and the third conductive layer 131 may be formed of W, Cu, TiN, TaN, WN,MoN, NbN, TiSiN, TiAlN, TiBN, ZrSiN, WSiN, WBN, ZrAlN, MoSiN, MoAlN,TaSiN, TaAlN, Ti, Mo, Ta, TiSi, TaSi, TiW, TiON, TiAlON, WON, TaON, or asemiconductor material, such as doped-Si or doped-SiGe, or the like.

As illustrated in FIG. 15, in the cell area, the hard mask 133, thethird conductive layer 131, the barrier metal layer 129, and the secondconductive layer 127 are patterned to expose an upper surface of thefourth insulating layer 121 formed in the cell area. Thus, a lowerelectrode stack is formed. A fifth insulating layer 135 is formedbetween lower electrode stacks.

As illustrated in FIG. 16, the hard mask 133, the third conductive layer131, the barrier metal layer 129, the second conductive layer 127, thefirst conductive layer 125, and the third gate oxide layer 123 in theperipheral area are patterned to form a gate stack G.

As illustrated in FIG. 17, a contact 137, which contacts thesemiconductor substrate 101 in the peripheral area, is formed and asixth insulating layer 139 is formed on the semiconductor substrate ofthe entire peripheral area, including the contact 137. The sixthinsulating layer 139 serves to protect a pattern formed in theperipheral area when the hard mask 133 in the cell area is removed in asubsequent process.

FIG. 18 illustrates only the cell area and illustrates a bottomstructure 300, in which a vertical transistor is formed. The lowerelectrode stack 127, 129, and 131 is formed on the bottom structure 300.A data storage material 143 is electrically connected to the lowerelectrode stack 127, 129, and 131, and an wiring layer 145 is formed.

Specifically, after the process illustrated in FIG. 17 is performed, thehard mask 133 in the cell area is removed and a space is formed betweenadjacent fifth insulating layers 135. A spacer insulating layer 141 isformed on a sidewall of the fifth insulating layer 135, a data storagematerial 143 is buried within the space, and the wiring layer 145 isformed on the semiconductor substrate, including the data storagematerial 143, so that the structure illustrated in FIG. 18 may beformed.

The data storage material 143 may include a material for a PCRAM, amaterial for a ReRAM, a material for a spin-transfer torquemagnetoresistive RAM (STTMRAM), and a material for a polymer RAM(PoRAM). For example, if the vertical memory device is a PCRAM, then thedata storage material may be tellurium (Te), selenium (Se), germanium(Ge), antimony (Sb), bismuth (Bi), lead (Pb), tin (Sn), arsenic (As),sulfur (S), silicon (Si), phosphorus (P), oxygen (O), nitrogen (N), acompound thereof, or an alloy thereof.

The method of forming the data storage material illustrated in FIG. 18is illustrative and any one of applicable various methods may be used.

The example in which the common source region 101A is formed through theion implantation process is merely illustrative. Alternatively, anwiring layer of a line pattern may be formed as the common source region101A.

The example of forming the vertical type semiconductor device in asingle layer has been illustrated. However, an exemplary vertical typesemiconductor device may be formed in a stacked structure, such as amultilevel stack structure. Alternatively, an exemplary semiconductordevice may have the cell structures illustrated in FIG. 18, in which thecell structures are sequentially, symmetrically stacked in a mirror typeon the basis of the wiring layer, or in which the cell structures aresymmetrically stacked in a mirror type on the basis of the common sourceregion.

The above implementation is illustrative and not limiting. Variousalternatives and equivalents are possible. The invention is not limitedby the implementation described herein. Nor is the invention limited toany specific type of semiconductor device. Other additions,subtractions, or modifications are obvious in view of the presentdisclosure and are intended to fall within the scope of the appendedclaims.

What is claimed is:
 1. A vertical type semiconductor device, comprising:a common source region formed in a cell area of a semiconductorsubstrate; a channel region formed on the common source region, thechannel region having a predetermined height and a first diameter; adrain region formed on the channel region, the drain region having apredetermined height and a second diameter larger than the firstdiameter; and a first gate electrode surrounding the channel region. 2.The vertical type semiconductor device of claim 1, further comprising: amemory cell formed on the drain region.
 3. The vertical typesemiconductor device of claim 2, wherein the memory cell includes aphase-change random access memory (PCRAM), a resistance RAM (ReRAM), aspin-transfer torque magnetoresistive RAM (STTMRAM), or a polymer RAM(PoRAM).
 4. The vertical type semiconductor device of claim 1, furthercomprising: a lower electrode formed on the drain region.
 5. Thevertical type semiconductor device of claim 4, further comprising asecond gate electrode formed on a peripheral area of the semiconductorsubstrate, wherein the second gate electrode is simultaneously formedwith the lower electrode of the cell area.
 6. The vertical typesemiconductor device of claim 4, further comprising: a data storagematerial formed on the lower electrode.
 7. The vertical typesemiconductor device of claim 6, wherein the data storage materialincludes tellurium (Te), selenium (Se), germanium (Ge), antimony (Sb),bismuth (Bi), lead (Pb), tin (Sn), arsenic (As), sulfur (5), silicon(Si), phosphorus (P), oxygen (O), nitrogen (N), a compound thereof, oran alloy thereof.
 8. A method of fabricating a vertical typesemiconductor device, the method comprising: providing a semiconductorsubstrate having a cell area and a peripheral area; patterning thesemiconductor substrate of the cell area to form a pillar structure;forming, in the pillar structure, a recess from a bottom of the pillarstructure to a predetermined height; and forming a first gate electrodeto surround the recess.
 9. The method of claim 8, wherein the formingthe pillar structure includes: patterning the semiconductor substrate ofthe cell area in to form first pattern structures; forming, on thesemiconductor substrate between the first pattern structures, a firstinsulating layer to the predetermined height; forming, between the firstpattern structures, a second insulating layer on the first insulatinglayer; patterning the semiconductor substrate of the cell area to form asecond pattern structure; forming a first gate insulating layer on anexposed surface of the semiconductor substrate; forming, between thesecond pattern structures, a third insulating layer to the predeterminedheight; forming a protection layer on a sidewall of the second patternstructure and on the third insulating layer; and removing the firstinsulating layer and the third insulating layer.
 10. The method of claim9, wherein the first insulating layer includes a material having an etchselectivity that is different than an etch selectivity of the secondinsulating layer.
 11. The method of claim 9, wherein the firstinsulating layer includes a material having a same etch selectivity asan etch selectivity of the second insulating layer.
 12. The method ofclaim 8, further comprising: forming a common source region, a channelregion, and a drain region in the semiconductor substrate before theforming the pillar structure.
 13. The method of claim 12, whereinforming a channel region comprises: forming a channel region from abottom of the pillar structure to the predetermined height.
 14. Themethod of claim 8, further comprising: forming a common source region, achannel region, and a drain region in semiconductor substrate after theforming a first gate electrode.
 15. The method of claim 14, whereinforming a channel region comprises: forming a channel region from abottom of the pillar structure to the predetermined height.
 16. Themethod of claim 8, further comprising: forming a gate insulating layeron an exposed portion of the semiconductor substrate and the recess,before the forming a first gate electrode in the recess.
 17. The methodof claim 8, further comprising: forming an insulating layer between thepillar structures, after the forming a first gate electrode.
 18. Themethod of claim 8, further comprising: simultaneously forming anelectrode layer on the pillar structure of the cell area and forming asecond gate electrode on the semiconductor substrate of the peripheralarea, after the forming a first gate electrode.
 19. The method of claim18, wherein the forming an electrode layer and a second gate electrodecomprises: sequentially forming a gate oxide layer and a firstconductive layer on the cell area and the peripheral area; removing thegate oxide layer and the first conductive layer in the cell area;forming a second conductive layer on the cell area and the peripheralarea; patterning, in the cell area, the second conductive layer to forman electrode layer electrically connected to each of the pillarstructures; and patterning, in the peripheral area, the secondconductive layer, the first conductive layer, and the gate oxide layerto form the second gate electrode.
 20. The method of claim 19, furthercomprising: forming a data storage material on the electrode layer. 21.The method of claim 8, further comprising: forming a memory cell on eachof the pillar structures.
 22. The method of claim 21, wherein theforming a memory cell includes: simultaneously forming an electrodelayer on each of the pillar structures of the cell area to beelectrically connected to each of the pillar structures and a secondgate electrode on the semiconductor substrate of the peripheral area;and forming a data storage material on the electrode layer.